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Introduction
Continuous wafermap (CWM) is a mathematical model that is developed within ASML. The major goal of the CWM is to provide a continuous and differentiable representation of a wafermap while eliminating the noise from the discrete measured topography data.
The CWM tries to provide the most close-to-reality model of different contributors (a.k.a components) to the exposed wafer topography. This includes the bare wafer and the device topography as well as the measurement noise. The CWM employs a least square fit minimization approach to provide the topography of each component separately. Some constraints in the form of penalty terms are added to ensure a physically meaningful representation of each component.
Your assignment
Within the Metrology Leveling group, we have two available assignments. Depending on your interests and the match, one of the following assignments will be assigned to you. When applying, please indicate your preference in a cover letter.
Assignment 1 - Repeated pattern recognition and removal
Despite applying the penalty terms, it is seen that in some cases there exist a crosstalk among the components of a CWM. As the device topography map has a repeated pattern, so is the crosstalk in the bare wafer map. It is crucial to detect the repeated device pattern in the bare wafer map and remove it as a post processing step.
The goal of this assignment is to gain a comprehensive understanding about the existing methods in the field of repeated pattern recognition. The literature review will be then followed by proposing the most feasible solution (with respect to accuracy and computation cost) to the existing problem.
Assignment 2 - Constrained Continuous Wafermap
Despite applying the penalty terms, it is seen that in some cases the components obtain unexpected values. Therefore, it is beneficial to apply bound constraints to the minimization problem while avoiding iterative numerical approaches.
The main goal of this assignment is to provide a mathematical approach to constrain the CWM components while having the least impact on the existing computation cost.
The start date of the assignments will be as soon as possible. The internship has a minimum duration of 5 months, for 5 days per week (minimum 3 days on-site).
Your profile
To be the perfect match for one of the internships, you:
Other requirements you need to meet
Diversity and inclusion
ASML is an Equal Opportunity Employer that values and respects the importance of a diverse and inclusive workforce. It is the policy of the company to recruit, hire, train and promote persons in all job titles without regard to race, color, religion, sex, age, national origin, veteran status, disability, sexual orientation, or gender identity. We recognize that diversity and inclusion is a driving force in the success of our company.
ASML is a leading supplier of lithography equipment, used by the world’s top chipmakers to print microchips that are increasingly powerful, fast and energy efficient. Working at ASML is inspiring, no matter what field you're in. That’s because we push the boundaries of technology: if it’s moving the world forward, chances are, we’re behind it. In fact, we’re probably a part of the electronic device you’re using right now.
We’re a global team of more than 32,000 people from 122 different nationalities and counting. Headquartered in Europe’s top tech hub, the Brainport Eindhoven region in the Netherlands, our operations are spread across Europe, Asia and the US.
We're moving technology forward
In fact, we’re probably a part of the electronic device you’re using right now. Our lithography technology is fundamental to mass producing semiconductor chips. With it, the world’s top chipmakers are creating microchips that are more powerful, faster and energy efficient.
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