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Are you passionate about driving technology innovation at the heart of ASML’s EUV products? Do you thrive on designing solutions that meet the needs of customers worldwide? Can you influence product design to enhance system availability, reliability, diagnostics, and cycle time? Do you enjoy collaborating across diverse teams while providing technical direction to Industrial Engineers?
If so, the Industrialization Architect for Beam Align & Focus role could be the perfect fit for you!
ASML’s TWINSCAN EXE and NXE systems lead the industry in extreme ultraviolet (EUV) lithography. These platforms use EUV light, generated by a tin-based plasma source, enabling our customers to continue Moore’s law by manufacturing integrated circuits at ever-smaller scales.
As Industrialization Architect for Beam Align and Focus within the EUV Source Laser Industrialization department, you will work in a fast-paced, multidisciplinary environment on the EXE and NXE platforms.
Design solutions that ensure our EUV systems are reliable, efficient, and easy to maintain. You’ll focus on improving system performance and serviceability by defining how key components—such as alignment mechanisms and safety features—work together within the Source Laser.
Key activities include:
The EUV Source Laser Industrialization department is part of the EUV Business Line.
This position requires access to controlled technology, as defined in the United States Export Administration Regulations (15 C.F.R. § 730, et seq.). Qualified candidates must be legally authorized to access such controlled technology prior to beginning work. Business demands may require ASML to proceed with candidates who are immediately eligible to access controlled technology.
We're moving technology forward
In fact, we’re probably a part of the electronic device you’re using right now. Our lithography technology is fundamental to mass producing semiconductor chips. With it, the world’s top chipmakers are creating microchips that are more powerful, faster and energy efficient.
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