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Introduction
At ASML’s Delft office, we are developing a multi-beam electron microscope for inspecting semiconductor wafers during production. A key component of this system is a micro-electromechanical (MEMS) module, which helps shape and direct the electron beams. Just as small imperfections in lenses or mounts can affect the performance of an optical system, manufacturing tolerances in the MEMS module can influence the behavior of the electron optics. Understanding how these tolerances affect system performance is essential for robust design.
Your assignment
As an intern, you will collaborate with our design team to investigate how manufacturing variations, such as small displacements or geometrical imperfections, impact the performance of the MEMS module.
This is a master internship with a minimum duration of 5 months and a minimum of 4 days per week (3 days on-site). The start date of this internship is February 2026 (or earlier).
Your Profile
To be a match for this internship, you:
Other requirements you need to meet
This position requires access to controlled technology, as defined in the United States Export Administration Regulations (15 C.F.R. § 730, et seq.). Qualified candidates must be legally authorized to access such controlled technology prior to beginning work. Business demands may require ASML to proceed with candidates who are immediately eligible to access controlled technology.
We're moving technology forward
In fact, we’re probably a part of the electronic device you’re using right now. Our lithography technology is fundamental to mass producing semiconductor chips. With it, the world’s top chipmakers are creating microchips that are more powerful, faster and energy efficient.
View what's on offer:
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