Chemistry internship: reuse of tin

Chemistry internship: reuse of tin

The mission of the Process & Cleanliness Control (PCC) group is to enable the ASML organization, Suppliers and Cleaning Service Providers to design, manufacture, assemble and clean mono-parts, modules and systems that fulfill the cleanliness specifications. Furthermore, the group is responsible for the identification, design and industrialization of the contamination removal processes and their verification techniques.

Your Assignment

Pressurized liquid tin with extremely high purity is the fuel for the EUV plasma generation and therefore essential for EUV operation. After EUV operation the tin gets collected in buckets inside the EUV source vessel and removed from the machine during periodic maintenance. Our goal is to reuse the tin which gets returned. However, during EUV operation this tin gets slightly contaminated and is therefore not suited to be reused.

As part of the PCC group, you will analyze the impurities present in tin that are returned from our customers. You will do a literature and scouting study into different purification methods. This study will be a combination of practical and theoretical work. Eventually, you will provide documentation on your findings and on how to industrialize the purification process at ASML, its supply chain or customer.

This is a Bachelor or Master graduation (thesis) or apprentice internship for around 6 months, 5 days per week. The start date of this internship is as soon as possible.

Your Profile

To be a good match for this internship you:

• Are pursuing a bachelor's or master's in Physics, Material Science, Chemistry or Chemical Engineering;
• Have strong affinity with Surface/Interfacial Chemistry and Materials Chemistry;
• Have experience with working in a lab environment or cleanroom;
• Have experience with evaluating data from XRD/XPS/SEM-EDX measurements and various optical/spectroscopy techniques (a plus).
• Have strong analytical skills and are solution-driven;
• Have good communication skills in English.

Other requirements you need to meet:

• You are enrolled at an educational institute for the entire duration of the internship;
• You are located in the Netherlands to perform your internship. In case you are currently living/studying outside of the Netherlands, your CV/motivation letter includes the willingness to relocate;
• If you are a non-EU citizen, studying in the Netherlands, your university is willing to sign the documents relevant for doing an internship (i.e., Nuffic agreement).

This position requires access to controlled technology, as defined in the United States Export Administration Regulations (15 C.F.R. § 730, et seq.). Qualified candidates must be legally authorized to access such controlled technology prior to beginning work. Business demands may require ASML to proceed with candidates who are immediately eligible to access controlled technology.

Diversity and inclusion

ASML is an Equal Opportunity Employer that values and respects the importance of a diverse and inclusive workforce. It is the policy of the company to recruit, hire, train and promote persons in all job titles without regard to race, color, religion, sex, age, national origin, veteran status, disability, sexual orientation, or gender identity. We recognize that diversity and inclusion is a driving force in the success of our company.

About Us

ASML is a leading supplier of lithography equipment, used by the world’s top chipmakers to print microchips that are increasingly powerful, fast and energy efficient. Working at ASML is inspiring, no matter what field you're in. That’s because we push the boundaries of technology: if it’s moving the world forward, chances are, we’re behind it. In fact, we’re probably a part of the electronic device you’re using right now.

We’re a global team of more than 32,000 people from 122 different nationalities and counting. Headquartered in Europe’s top tech hub, the Brainport Eindhoven region in the Netherlands, our operations are spread across Europe, Asia and the US.