If you have the strength of personality to take ownership of a problem and create a vision of how to solve it – a vision that also inspires others - then the ASML Overlay Reference and Control group, providing overlay reference to all ASML scanners, is your ideal environment for personal development and professional growth.
ASML builds lithography systems that can place multiple layers on a chip with very high precision (overlay). The overlay accuracy demand is determined by design of the chip. To setup systems for overlay special “rulers” are needed. These rulers are called Overlay reference wafers and reticles. To make them, position of marks on the wafers is determined with the accuracy of 0.3nm and stored in ‘Wafer Error Correction’ (WEC) files. As “WEC architect”, you have full technical responsibility for the delivery of WEC, and to guarantee the measurement quality and high yield of the wafer production at ASML factory. You do this by combining your physics thinking and complex data analysis.
Technical University masters, preferably PhD, in physics, mathematics or similar
Context of the position
Within ASML, the sector Development & Engineering is responsible for specification and design of ASML products. The department DUV System Performance is responsible for specification definition, and qualification of functional modules & machine/customer applications on spec, within time and budget in the areas of overlay, imaging, focus and productivity. You will be working in a multidisciplinary project team, in a dynamic and high-tech environment.
BE PART OF PROGRESS
We make machines that make chips; the hearts of the devices that keep us informed, entertained and safe. Our key technology is the lithography system, which brings together high-tech hardware and advanced software to control the chip manufacturing process. All of the world’s top chipmakers like Samsung, Intel and TSMC use our technology, enabling the waves of innovation that help tackle the world’s toughest challenges.
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